ISO 21466:2019
ISO 21466:2019 Microbeam analysis – Scanning electron microscopy – Method for evaluating critical dimensions by CD-SEM
CDN $336.00
Description
This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.
Edition
1
Published Date
2019-12-13
Status
PUBLISHED
Pages
47
Language
English
Format
Secure PDF
Secure – PDF details
- Save your file locally or view it via a web viewer
- Viewing permissions are restricted exclusively to the purchaser
- Device limits - 3
- Printing – Enabled only to print (1) copy
See more about our Environmental Commitment
Abstract
This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.
Previous Editions
Can’t find what you are looking for?
Please contact us at:
Related Documents
-
ISO 10110:2019 Optics and photonics – Preparation of drawings for optical elements and systems – Part 1: General
CDN $336.00 Add to cart -
ISO 10110:2016 Optics and photonics – Preparation of drawings for optical elements and systems – Part 9: Surface treatment and coating
CDN $124.00 Add to cart -
ISO 10110:2015 Optics and photonics – Preparation of drawings for optical elements and systems – Part 19: General description of surfaces and components
CDN $124.00 Add to cart -
ISO 10110:2018 Optics and photonics – Preparation of drawings for optical elements and systems – Part 18: Stress birefringence, bubbles and inclusions, homogeneity, and striae
CDN $251.00 Add to cart
