Sky Bear Technical Standards - Home
Search
×
FR

Placeholder headline

This is just a placeholder headline

B51-14 (R2019) – Boiler, pressure vessel, and pressure piping code

$

362

BUY NOW

ISO 21859:2019

ISO 21859:2019 Fine ceramics (advanced ceramics, advanced technical ceramics) – Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

CDN $85.00

SKU: 8544d0b8b546 Categories: ,

Description

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

Edition

1

Published Date

2019-06-18

Status

PUBLISHED

Pages

4

Language Detail Icon

English

Format Secure Icon

Secure PDF

Abstract

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

Previous Editions

Can’t find what you are looking for?

Please contact us at: