
ISO 19383:2026
ISO 19383:2026 Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors
CDN $186.00
This publication was last reviewed and confirmed in 2026.
Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors
SKU: 8597f06cf521
Categories: ICS:25.220.01, SUSTAINABLE_DEVELOPMENT_GOAL:9
Description
This document defines the chemical characteristics and related process specifications of atomic layer deposition precursors, including assay content, metal purity and anion content specification.
Edition
1
Published Date
2026-06-19
Status
PUBLISHED
Pages
13
Format 
Secure PDF
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Abstract
This document defines the chemical characteristics and related process specifications of atomic layer deposition precursors, including assay content, metal purity and anion content specification.
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