ISO 19383:2026
ISO 19383:2026 Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors
CDN $186.00
This publication was last reviewed and confirmed in 2026.
Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors
Description
This document defines the chemical characteristics and related process specifications of atomic layer deposition precursors, including assay content, metal purity and anion content specification.
Edition
1
Published Date
2026-06-19
Status
PUBLISHED
Pages
13
Language
English
Format
Secure PDF
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Abstract
This document defines the chemical characteristics and related process specifications of atomic layer deposition precursors, including assay content, metal purity and anion content specification.
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