ISO 21859:2019
ISO 21859:2019 Fine ceramics (advanced ceramics, advanced technical ceramics) – Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
CDN $86.00
Description
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
Edition
1
Published Date
2019-06-18
Status
PUBLISHED
Pages
4
Language
English
Format
Secure PDF
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Abstract
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
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