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ISO 5458:2018

ISO 5458:2018 Geometrical product specifications (GPS) – Geometrical tolerancing – Pattern and combined geometrical specification

CDN $336.00

SKU: 9acacc948c9f Categories: ,

Description

This document establishes complementary rules to ISO 1101 to be applied to pattern specifications and defines rules to combine individual specifications, for geometrical specifications e.g. using the symbols POSITION, SYMMETRY, LINE PROFILE and SURFACE PROFILE, as well as STRAIGHTNESS (in the case where the toleranced features are nominally coaxial) and FLATNESS (in the case where the toleranced features are nominally coplanar) as listed in Annex C.

These rules apply when a set of tolerance zones are grouped together with location or orientation constraints, through the use of the CZ, CZR or SIM modifiers.

This document does not cover the use of the pattern specifications when the least and maximum material requirement is applied (see ISO 2692).

This document does not cover the establishment of common datum (see ISO 5459) based on pattern features.

Edition

3

Published Date

2018-05-24

Status

PUBLISHED

Pages

44

Language Detail Icon

English

Format Secure Icon

Secure PDF

Abstract

This document establishes complementary rules to ISO 1101 to be applied to pattern specifications and defines rules to combine individual specifications, for geometrical specifications e.g. using the symbols POSITION, SYMMETRY, LINE PROFILE and SURFACE PROFILE, as well as STRAIGHTNESS (in the case where the toleranced features are nominally coaxial) and FLATNESS (in the case where the toleranced features are nominally coplanar) as listed in Annex C.

These rules apply when a set of tolerance zones are grouped together with location or orientation constraints, through the use of the CZ, CZR or SIM modifiers.

This document does not cover the use of the pattern specifications when the least and maximum material requirement is applied (see ISO 2692).

This document does not cover the establishment of common datum (see ISO 5459) based on pattern features.

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