Search
×
FR

Placeholder headline

This is just a placeholder headline

API MPMS CH 10.8, 3rd Edition: Standard Test Method for Sediment in Crude Oil by Membrane Filtration

$

114

BUY NOW

Placeholder headline

This is just a placeholder headline

ISO/TR 42505:2026 Sharing economy — Shared manufacturing — Concepts and models

$

192

BUY NOW

Placeholder headline

This is just a placeholder headline

ISO 4306-1:2026 Cranes — Vocabulary — Part 1: General

$

436

BUY NOW

ISO 7530:1992

ISO 7530:1992 Nickel alloys – Flame atomic absorption spectrometric analysis – Part 7: Determination of aluminium content

CDN $86.00

SKU: 10c6fc962207 Category:

Description

Silicon content can be determined in the range of 0,2 % (m/m) to 1 % (m/m). The principle is dissolution of a test portion in acid, filtration and aspiration of the test solution into a nitrous oxide-acetylene flame of an atomic absorption spectrometer, combustion of the filter, volatilization of silica, fusion of the residue, dissolution of the melt in dilute acid, aspiration of this second solution into another such flame, measurement of the absorbance of the resonance line energy from the spectrum of aluminium and comparison with that of calibration solutions at 309,3 nm.

Edition

1

Published Date

1992-09-03

Status

PUBLISHED

Pages

4

Language Detail Icon

English

Format Secure Icon

Secure PDF

Abstract

Silicon content can be determined in the range of 0,2 % (m/m) to 1 % (m/m). The principle is dissolution of a test portion in acid, filtration and aspiration of the test solution into a nitrous oxide-acetylene flame of an atomic absorption spectrometer, combustion of the filter, volatilization of silica, fusion of the residue, dissolution of the melt in dilute acid, aspiration of this second solution into another such flame, measurement of the absorbance of the resonance line energy from the spectrum of aluminium and comparison with that of calibration solutions at 309,3 nm.

Previous Editions

Can’t find what you are looking for?

Please contact us at: