
ISO 25164:2026
ISO 25164:2026 Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification
CDN $85.00
This publication was last reviewed and confirmed in 2026.
Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification
SKU: 25967ba40157
Categories: ICS:25.220.40, SUSTAINABLE_DEVELOPMENT_GOAL:9
Description
This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering.
This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.
Edition
1
Published Date
2026-09-16
Status
PUBLISHED
Pages
6
Format 
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Abstract
This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering.
This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.
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