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B51-14 (R2019) – Boiler, pressure vessel, and pressure piping code

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ISO 15969:2021

ISO 15969:2021 Surface chemical analysis – Depth profiling – Measurement of sputtered depth

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Description

This document provides guidelines for measuring the sputtered depth in sputtered depth profiling. 

The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.

Edition

2

Published Date

2021-03-17

Status

PUBLISHED

Pages

13

Language Detail Icon

English

Format Secure Icon

Secure PDF

Abstract

This document provides guidelines for measuring the sputtered depth in sputtered depth profiling. 

The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.

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