ISO 15969:2021
ISO 15969:2021 Surface chemical analysis – Depth profiling – Measurement of sputtered depth
CDN $195.00
Description
This document provides guidelines for measuring the sputtered depth in sputtered depth profiling. 
The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.
Edition
2
Published Date
2021-03-17
Status
PUBLISHED
Pages
13
Language
English
Format
Secure PDF
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Abstract
This document provides guidelines for measuring the sputtered depth in sputtered depth profiling. 
The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.
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