ISO 13424:2013
ISO 13424:2013 Surface chemical analysis – X-ray photoelectron spectroscopy – Reporting of results of thin-film analysis
CDN $352.00
Description
ISO 13424:2013 specifies the minimum amount of information required in reports of analyses of thin films on a substrate by XPS. These analyses involve measurement of the chemical composition and thickness of homogeneous thin films, and measurement of the chemical composition as a function of depth of inhomogeneous thin films by angle-resolved XPS, XPS sputter-depth profiling, peak-shape analysis, and variable photon energy XPS.
Edition
1
Published Date
2013-09-23
Status
PUBLISHED
Pages
46
Language
English
Format
Secure PDF
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Abstract
ISO 13424:2013 specifies the minimum amount of information required in reports of analyses of thin films on a substrate by XPS. These analyses involve measurement of the chemical composition and thickness of homogeneous thin films, and measurement of the chemical composition as a function of depth of inhomogeneous thin films by angle-resolved XPS, XPS sputter-depth profiling, peak-shape analysis, and variable photon energy XPS.
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