ISO 14237:2010
ISO 14237:2010 Surface chemical analysis – Secondary-ion mass spectrometry – Determination of boron atomic concentration in silicon using uniformly doped materials
CDN $259.00
Description
ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.
Edition
2
Published Date
2010-07-09
Status
PUBLISHED
Pages
19
Language
English
Format
Secure PDF
Secure – PDF details
- Save your file locally or view it via a web viewer
- Viewing permissions are restricted exclusively to the purchaser
- Device limits - 3
- Printing – Enabled only to print (1) copy
See more about our Environmental Commitment
Abstract
ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.
Previous Editions
Can’t find what you are looking for?
Please contact us at:
Related Documents
-
ISO 16840:2006 Wheelchair seating – Part 1: Vocabulary, reference axis convention and measures for body segments, posture and postural support surfaces
CDN $391.00 Add to cart -
ISO 8927:1991 Earth-moving machinery – Machine availability – Vocabulary
CDN $259.00 Add to cart -
ISO 80004:2021 Nanotechnologies – Vocabulary – Part 6: Nano-object characterization
CDN $85.00 Add to cart -
ISO 80004:2020 Nanotechnologies – Vocabulary – Part 3: Carbon nano-objects
CDN $85.00 Add to cart
