ISO 22415:2019
ISO 22415:2019 Surface chemical analysis – Secondary ion mass spectrometry – Method for determining yield volume in argon cluster sputter depth profiling of organic materials
CDN $310.00
Description
This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the specified material layer has homogeneous composition in depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. This document is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.
Edition
1
Published Date
2019-05-10
Status
PUBLISHED
Pages
30
Language
English
Format
Secure PDF
Secure – PDF details
- Save your file locally or view it via a web viewer
- Viewing permissions are restricted exclusively to the purchaser
- Device limits - 3
- Printing – Enabled only to print (1) copy
See more about our Environmental Commitment
Abstract
This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the specified material layer has homogeneous composition in depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. This document is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.
Previous Editions
Can’t find what you are looking for?
Please contact us at:
Related Documents
-
ISO 80004:2011 Nanotechnologies – Vocabulary – Part 7: Diagnostics and therapeutics for healthcare
CDN $131.00 Add to cart -
ISO 4006:1991 Measurement of fluid flow in closed conduits – Vocabulary and symbols
CDN $397.00 Add to cart -
ISO 20537:2025 Footwear – Identification of defects during visual inspection – Vocabulary
CDN $310.00 Add to cart -
ISO 80000:2025 Quantities and units – Part 13: Information science and technology
CDN $224.00 Add to cart
