ISO 23170:2022
ISO 23170:2022 Surface chemical analysis – Depth profiling – Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
CDN $273.00
Description
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
Edition
1
Published Date
2022-06-15
Status
PUBLISHED
Pages
29
Language
English
Format
Secure PDF
Secure – PDF details
- Save your file locally or view it via a web viewer
- Viewing permissions are restricted exclusively to the purchaser
- Device limits - 3
- Printing – Enabled only to print (1) copy
See more about our Environmental Commitment
Abstract
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
Previous Editions
Can’t find what you are looking for?
Please contact us at:
Related Documents
-
ISO 3833:1977 Road vehicles – Types – Terms and definitions
CDN $115.00 Add to cart -
ISO 4006:1991 Measurement of fluid flow in closed conduits – Vocabulary and symbols
CDN $351.00 Add to cart -
ISO 80000:2019 Quantities and units – Part 11: Characteristic numbers
CDN $312.00 Add to cart -
ISO 80004:2020 Nanotechnologies – Vocabulary – Part 3: Carbon nano-objects
CDN $76.00 Add to cart
