ISO 23170:2022
ISO 23170:2022 Surface chemical analysis – Depth profiling – Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
CDN $310.00
Description
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
Edition
1
Published Date
2022-06-15
Status
PUBLISHED
Pages
29
Language
English
Format
Secure PDF
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Abstract
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
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