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B51-14 (R2019) – Boiler, pressure vessel, and pressure piping code

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ISO 23170:2022

ISO 23170:2022 Surface chemical analysis – Depth profiling – Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

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Description

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

Edition

1

Published Date

2022-06-15

Status

PUBLISHED

Pages

29

Language Detail Icon

English

Format Secure Icon

Secure PDF

Abstract

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

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