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ISO 17109:2022 Surface chemical analysis – Depth profiling – Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
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ISO 5771:2024 Rubber hoses and hose assemblies for transferring anhydrous ammonia – Specification
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ISO 23812:2009 Surface chemical analysis – Secondary-ion mass spectrometry – Method for depth calibration for silicon using multiple delta-layer reference materials
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ISO 17560:2014 Surface chemical analysis – Secondary-ion mass spectrometry – Method for depth profiling of boron in silicon
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ISO 16664:2017 Gas analysis – Handling of calibration gases and gas mixtures – Guidelines
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ISO 12963:2017 Gas analysis – Comparison methods for the determination of the composition of gas mixtures based on one- and two-point calibration
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ISO 10632:2000 Oilseed residues – Simultaneous determination of oil and water contents – Method using pulsed nuclear magnetic resonance spectroscopy
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ISO 15661:2020 Copper and nickel sulfide ores and concentrates – Determination of total chlorine content – Alkaline fusion and potentiometric titration method
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ISO 13543:2016 Copper, lead, zinc and nickel sulfide concentrates – Determination of mass of contained metal in a lot
CDN $124.00 Add to cart





