ICS:71.040.40
Showing 91–99 of 134 results
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ISO 16413:2020 Evaluation of thickness, density and interface width of thin films by X-ray reflectometry – Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
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ISO 18115:2021 Surface chemical analysis – Vocabulary – Part 2: Terms used in scanning-probe microscopy
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ISO 760:1978 Determination of water – Karl Fischer method (General method)
CDN $131.00 Add to cart -

ISO 17109:2022 Surface chemical analysis – Depth profiling – Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
CDN $263.00 Add to cart -

ISO 7431:2024 Thiourea for industrial use – Part 1: Test methods
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ISO 5861:2024 Surface chemical analysis – X-ray photoelectron spectroscopy – Method of intensity calibration for quartz-crystal monochromated Al KŒ± XPS instruments
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ISO 7431:2024 Thiourea for industrial use – Part 2: Specifications
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ISO 15472:2010 Surface chemical analysis – X-ray photoelectron spectrometers – Calibration of energy scales
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ISO 6142:2024 Gas analysis – Preparation of calibration gas mixtures – Part 2: Gravimetric method for Class II mixtures
CDN $195.00 Add to cart





