ICS:71.040.40
Showing 109–117 of 137 results
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ISO 16413:2020 Evaluation of thickness, density and interface width of thin films by X-ray reflectometry – Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
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ISO 14912:2025 Gas analysis — Conversion of gas mixture composition data
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ISO 17109:2022 Surface chemical analysis – Depth profiling – Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
CDN $261.00 Add to cart -
ISO 23812:2009 Surface chemical analysis – Secondary-ion mass spectrometry – Method for depth calibration for silicon using multiple delta-layer reference materials
CDN $261.00 Add to cart -
ISO 18115:2021 Surface chemical analysis – Vocabulary – Part 2: Terms used in scanning-probe microscopy
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ISO 6142:2024 Gas analysis – Preparation of calibration gas mixtures – Part 2: Gravimetric method for Class II mixtures
CDN $193.00 Add to cart -
ISO 21079:2008 Chemical analysis of refractories containing alumina, zirconia and silica – Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) – Part 1: Apparatus, reagents and dissolution
CDN $192.00 Add to cart -
ISO 16129:2018 Surface chemical analysis – X-ray photoelectron spectroscopy – Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
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ISO 14187:2020 Surface chemical analysis – Characterization of nanostructured materials
CDN $347.00 Add to cart
