ICS:71.040.40
Showing 82–90 of 126 results
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ISO 18115:2023 Surface chemical analysis – Vocabulary – Part 1: General terms and terms used in spectroscopy
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ISO 23729:2022 Surface chemical analysis – Atomic force microscopy – Guideline for restoration procedure for atomic force microscopy images dilated by finite probe size
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ISO 5861:2024 Surface chemical analysis РX-ray photoelectron spectroscopy РMethod of intensity calibration for quartz-crystal monochromated Al Kα XPS instruments
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ISO 18118:2024 Surface chemical analysis – Auger electron spectroscopy and X-ray photoelectron spectroscopy – Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
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ISO 6142:2024 Gas analysis – Preparation of calibration gas mixtures – Part 2: Gravimetric method for Class II mixtures
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ISO 17109:2022 Surface chemical analysis – Depth profiling – Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
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ISO 23812:2009 Surface chemical analysis – Secondary-ion mass spectrometry – Method for depth calibration for silicon using multiple delta-layer reference materials
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ISO 17560:2014 Surface chemical analysis – Secondary-ion mass spectrometry – Method for depth profiling of boron in silicon
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ISO 16664:2017 Gas analysis – Handling of calibration gases and gas mixtures – Guidelines
CDN $173.00 Add to cart
